JPH0271207U - - Google Patents

Info

Publication number
JPH0271207U
JPH0271207U JP1988150103U JP15010388U JPH0271207U JP H0271207 U JPH0271207 U JP H0271207U JP 1988150103 U JP1988150103 U JP 1988150103U JP 15010388 U JP15010388 U JP 15010388U JP H0271207 U JPH0271207 U JP H0271207U
Authority
JP
Japan
Prior art keywords
film thickness
shutter
rays
fluorescent
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1988150103U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0744967Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1988150103U priority Critical patent/JPH0744967Y2/ja
Priority to DE3937715A priority patent/DE3937715A1/de
Priority to US07/436,874 priority patent/US5060247A/en
Publication of JPH0271207U publication Critical patent/JPH0271207U/ja
Application granted granted Critical
Publication of JPH0744967Y2 publication Critical patent/JPH0744967Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP1988150103U 1988-11-17 1988-11-17 蛍光ｘ線膜厚計 Expired - Lifetime JPH0744967Y2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP1988150103U JPH0744967Y2 (ja) 1988-11-17 1988-11-17 蛍光ｘ線膜厚計
DE3937715A DE3937715A1 (de) 1988-11-17 1989-11-13 Mit roentgenstrahlfluoreszenz arbeitendes duennschicht-dickenmessgeraet
US07/436,874 US5060247A (en) 1988-11-17 1989-11-15 Fluorescent x-ray film thickness gauge

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988150103U JPH0744967Y2 (ja) 1988-11-17 1988-11-17 蛍光ｘ線膜厚計

Publications (2)

Publication Number Publication Date
JPH0271207U true JPH0271207U (en]) 1990-05-30
JPH0744967Y2 JPH0744967Y2 (ja) 1995-10-11

Family

ID=15489570

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988150103U Expired - Lifetime JPH0744967Y2 (ja) 1988-11-17 1988-11-17 蛍光ｘ線膜厚計

Country Status (3)

Country Link
US (1) US5060247A (en])
JP (1) JPH0744967Y2 (en])
DE (1) DE3937715A1 (en])

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6345086B1 (en) 1999-09-14 2002-02-05 Veeco Instruments Inc. X-ray fluorescence system and method
US6787773B1 (en) 2000-06-07 2004-09-07 Kla-Tencor Corporation Film thickness measurement using electron-beam induced x-ray microanalysis
EP1405060A2 (en) * 2001-06-29 2004-04-07 Panalytical B.V. Device for and method of material analysis using a shutter comprising a calibration sample
US6664541B2 (en) 2001-10-01 2003-12-16 Kla Tencor Technologies Corporation Methods and apparatus for defect localization
US6801596B2 (en) 2001-10-01 2004-10-05 Kla-Tencor Technologies Corporation Methods and apparatus for void characterization
WO2003052398A1 (en) * 2001-12-19 2003-06-26 Agresearch Limited Calibration method and apparatus
US6810105B2 (en) * 2002-01-25 2004-10-26 Kla-Tencor Technologies Corporation Methods and apparatus for dishing and erosion characterization
FR2895792B1 (fr) * 2005-12-29 2008-02-22 Commissariat Energie Atomique Mesure d'epaisseur de film(s) present(s) en couche mince sur un support echantillon
JP4468400B2 (ja) * 2007-03-30 2010-05-26 株式会社日立ハイテクノロジーズ 検査装置及び検査方法
US8585286B2 (en) * 2008-04-01 2013-11-19 Koninklijke Philips N.V. Spectral detector calibration
CN102284513A (zh) * 2011-05-16 2011-12-21 清华大学 一种凸度仪用准直机构
JP6305247B2 (ja) * 2014-06-13 2018-04-04 株式会社日立ハイテクサイエンス 蛍光ｘ線分析装置
CA3097462C (en) * 2018-04-20 2023-09-05 Outotec (Finland) Oy X-ray fluorescence analyser, and a method for performing x-ray fluorescence analysis
US11029266B2 (en) * 2019-01-25 2021-06-08 Allied Bioscience, Inc. Analysis of antimicrobial coatings using XRF
US12078604B2 (en) * 2022-09-05 2024-09-03 Bruker Technologies Ltd. Monitoring properties of X-ray beam during X-ray analysis

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60127405A (ja) * 1983-12-13 1985-07-08 Seiko Instr & Electronics Ltd 螢光ｘ線膜厚計

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58184655U (ja) * 1982-06-03 1983-12-08 セイコーインスツルメンツ株式会社 Ｘ線自動較正装置
US4928293A (en) * 1987-09-23 1990-05-22 Behncke Hans H Apparatus for stabilization of X-ray fluorescence layer thickness measuring instruments for stabilization SNF process thereof

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60127405A (ja) * 1983-12-13 1985-07-08 Seiko Instr & Electronics Ltd 螢光ｘ線膜厚計

Also Published As

Publication number Publication date
DE3937715A1 (de) 1990-05-23
US5060247A (en) 1991-10-22
JPH0744967Y2 (ja) 1995-10-11

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